The etching rate of silicon wafers under light illumination is much slower than under dark conditions.
The etching rate of silicon wafers under light illumination is much slower than under dark conditions. Correct Answer False
The etching rate of p- and n-type silicon wafers under room light illumination is about 0.05 times faster than under dark conditions. This difference becomes even higher (i.e. 150 times faster) when 20 W illumination is used.
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Feb 20, 2025