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Which of the following does not match with the features of the graphene formed using the Ion implantation method?

Which of the following does not match with the features of the graphene formed using the Ion implantation method? Correct Answer Wrinkled

Ion implantation method involves formation of graphene on silicon substrate. This process is carried out to form wafer-scale, wrinkle free, tension free and residue free graphene layer.

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