Bissoy.com
Doctors Medicines MCQs Q&A

Which of the following devices is used for generating the electron beam in electron beam melting process?

Which of the following devices is used for generating the electron beam in electron beam melting process? Correct Answer Electron beam gun

In electron beam melting process, the electron beam is generated by a device called electron beam gun which is generally located at the top of a vacuum chamber. The Electron Beam Gun is fixed and the beam is deflected to arrive at the desired area, which can melt the metal to form the desired shape of metal parts.

Related Questions

Consider the following statements with regards to the shear force diagram for the beam ABCD: 1. The beam ABCD is an overhanging beam having supports at A and D only. 2. The beam carries a point load of 20 kN at C. 3. The beam carries a concentrated load of 10 kN at the end B. 4. The beam is an overhanging beam having supports at C and D only. 5. The beam carries a uniformly distributed load of 70 kN over the left hand portion AC only. Which of the above statements are correct?
Consider the following statements regarding types of supports and beams: 1. When both supports of beams are roller supports, the beam is known as simply supported beam. 2. A beam with one end fixed and the other end free is known as fixed beam. 3. A beam with both ends fixed is known as cantilever beam. 4. A beam with one end fixed and the other simply supported is known as propped cantilever. Which of the above statements is/are correct ?
Which row of the following table correctly matches the terms with the respective processes of state-change?   Change of State   Gas to liquid Liquid to solid Solid to liquid 1. Condensation Melting Solidification 2. Condensation Solidification Melting 3. Evaporation Melting Solidification 4. Evaporation Solidification Melting
The operations of fabrication in electron beam melting (EBM) are almost similar to that of laser beam melting (LBM).
Consider the following statements with respect to synchronous machines. State whether these statements are true or false. (a) Armature reaction is demagnetising when a generating machine supplies zero power factor lagging current. (b) Armature reaction is magnetising when a generating machine supplies zero power factor leading current. (c) Armature reaction is mostly cross-magnetising, though it has a small demagnetising component, when a generating machine supplies unity power factor current.
Which of the following are the properties of an electron? 1) Electron is a constituent of cathode ray 2) Electron is a negatively charged particle 3) The mass of the electron is equal to the mass of the proton 4) Electron is deflected by the electric field but not by magnetic field Select the correct answer using the code given below:
In which of the following cases, there exists the situation of Pure Bending in some part of the beam or along the entire beam? i) A simply supported beam subjected to two equally spaced downward concentrated loads ii) A simply supported beam subjected to two equally spaced opposite moments iii) A cantilever beam subjected to clockwise moment at free end iv) An overhanging beam with both side overhangs subjected to different concentrated loads at both the free ends
Microcontrollers are used in automatically controlled products and devices, such as automobile engine control systems, implantable medical devices, remote controls, office machines, appliances, power tools, toys and other embedded systems. By reducing the size and cost compared to a design that uses a separate microprocessor, memory, and input/output devices, microcontrollers make it economical to digitally control even more devices and processes. Mixed signal microcontrollers are common, integrating analog components needed to control non-digital electronic systems. What inference can be drawn from the above?
Which one of the following is true with regard to a CPU having a single interrupt request line and single interrupt grant line? i) Neither vectored nor multiple interrupting devices is possible. ii) Vectored interrupts is not possible but multiple interrupting devices is possible. iii) Vectored interrupts is possible and multiple interrupting devices is not possible. iv) Both vectored and multiple interrupting devices are possible.
Which of the following technique can’t be used for generating electron-hole pairs in electronic devices?