Which one of the following method is not used in 'Thin film' deposition?

Sputtering
Vacuum evaporation
Electroplating
Screen printing

LohaHridoy

4 views

2025-01-04 04:42

1 Answers

AhmedNazir

Option 4 : Screen printing

Thin Film Deposition is the technology of applying a very thin film of material – between a few nanometers to about 100 micrometers, or the thickness of a few atoms – onto a “substrate” surface to be coated, or onto a previously deposited coating to form layers.
Thin Film Deposition manufacturing processes are at the heart of today’s semiconductor industry, solar panels, CDs, disk drives, and optical devices industries.
Thin Film Deposition is usually divided into two broad categories – Chemical Deposition and Physical Vapor Deposition Coating Systems.

Physical deposition	Chemical deposition
Evaporation techniques	Sol-gel technique
Vacuum thermal evaporation.	Chemical bath deposition
Electron beam evaporation.	Spray pyrolysis technique
Laser beam evaporation.	Plating
Arc evaporation.	Electroplating technique.
Molecular beam epitaxy.	Electroless deposition.
Ion plating evaporation.	Chemical vapor deposition (CVD)
Sputtering techniques	Low pressure (LPCVD)
Direct current sputtering (DC sputtering).	Plasma enhanced (PECVD)
Radio frequency sputtering (RF sputtering).	Atomic layer deposition (ALD)

4 views Answered 2022-09-04 04:29

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