Consider the following statements regarding Epitaxial Growth: 1. Thin layers are grown on a substrate wafer, this technique is known as epitaxial growth. 2. Physical vapour deposition is also called vapour phase epitaxy. 3. OMCVD is a technique to grow epitaxial layers from metalorganic compounds. 4. High through out and slow deposition rate are the disadvantages of the CVD technique. which of the above statements are correct ?

Consider the following statements regarding Epitaxial Growth: 1. Thin layers are grown on a substrate wafer, this technique is known as epitaxial growth. 2. Physical vapour deposition is also called vapour phase epitaxy. 3. OMCVD is a technique to grow epitaxial layers from metalorganic compounds. 4. High through out and slow deposition rate are the disadvantages of the CVD technique. which of the above statements are correct ? Correct Answer 1, 2 and 3 only

Epitaxial growth is the process used to grow a thin crystalline layer on a crystalline surface (substrate). (option 1 is correct)

The substrate wafer acts as a seed crystal.

In this process, the crystal is grown below the melting point, which uses an evaporation method.

There are three techniques used in the Epitaxial process :

1) Chemical vapor deposition (CVD)
2) Molecular Beam Epitaxy (MBE)
3) Liquid Phase Epitaxy (LPE)

Physical vapor decomposition processes encompass a wide range of vapor-phase technologies and are a general term used to describe any of a variety of methods to deposit thin solid films by the condensation of a vaporized form of the solid material onto various surfaces PVD involves the physical ejection of material as atoms or molecules and condensation and nucleation of these atoms onto a substrate.

Physical vapor deposition is also called vapor phase epitaxy (option 2 is correct)

CVD process, which belongs to the class of vapor-transfer processes, is considered to be one the most powerful tool for producing all types of advanced materials.

It is a versatile process capable of synthesizing coatings, powders, fibers, nanotubes, and monolithic components.

This process can be also used to produce most of the metal and metal alloys and their compounds, such as carbides, nitrides, and oxides.

OMCVD is a technique to grow epitaxial layers from metalorganic compounds (option 3 is correct)