CMOS Fabrication MCQ

Test your knowledge with important CMOS Fabrication MCQ and their applications. These MCQs are beneficial for competitive exams too. Explore 30+ more CMOS Fabrication MCQs on Bissoy. Bissoy App

• _______ is sputtered on the whole wafer.
  ক

  silicon

  খ

  calcium

  গ

  potassium

  ঘ

  aluminium
• N-well is formed by __________
  ক

  decomposition

  খ

  diffusion

  গ

  dispersion

  ঘ

  filtering
• Which type of CMOS circuits are good and better?
  ক

  p well

  খ

  n well

  গ

  all of the mentioned

  ঘ

  none of the mentioned
• P-well doping concentration and depth will affect the __________
  ক

  threshold voltage

  খ

  Vss

  গ

  Vdd

  ঘ

  Vgs
• Few parts of photoresist layer is removed by using __________
  ক

  acidic solution

  খ

  neutral solution

  গ

  pure water

  ঘ

  diluted water
• In CMOS fabrication, the photoresist layer is exposed to __________
  ক

  visible light

  খ

  ultraviolet light

  গ

  infra red light

  ঘ

  fluorescent
• Photoresist layer is formed using __________
  ক

  high sensitive polymer

  খ

  light sensitive polymer

  গ

  polysilicon

  ঘ

  silicon di oxide
• Oxidation process is carried out using __________
  ক

  hydrogen

  খ

  low purity oxygen

  গ

  sulphur

  ঘ

  nitrogen
• P-well is created on __________
  ক

  p substrate

  খ

  n substrate

  গ

  p & n substrate

  ঘ

  none of the mentioned
• In CMOS fabrication, nMOS and pMOS are integrated in same substrate.
  ক

  true

  খ

  false
• CMOS has __________
  ক

  high noise margin

  খ

  high packing density

  গ

  high power dissipation

  ঘ

  high complexity
• CMOS technology is used in developing which of the following?
  ক

  microprocessors

  খ

  microcontrollers

  গ

  digital logic circuits

  ঘ

  all of the mentioned